these_morel's cl2-o2 [14 articles] Export

Recent papers added to these_morel's library classified by the tag cl2-o2. You can also see everyone's cl2-o2.

	Tungsten metal gate etching in Cl[sub 2]/O[sub 2] inductively coupled high density plasmas [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 6. (2008), pp. 1875-1882. by T. Morel, S. Bamola, R. Ramos, A. Beaurain, E. Pargon, O. Joubert posted to cl2-nf3-o2 cl2-o2 metal-gate tungsten xps by these_morel on 2009-06-02 15:05:04 as
	Analysis of the UV absorption spectrum of ClO: a comparative study of four methods for spectral computations [My Copy] Journal of Quantitative Spectroscopy and Radiative Transfer, Vol. 62, No. 3. (June 1999), pp. 345-369. by D. Maric, J. P. Burrows posted to absorption cl2-o2 clo by these_morel on 2008-04-10 07:45:00 as
	Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas [My Copy] Plasma Sources Science and Technology, Vol. 13, No. 3. (2004), pp. 522-530. by G. Cunge, M. Kogelschatz, N. Sadeghi posted to absorption cl2 cl2-o2 dissociation etching parois plasma silicon by these_morel on 2008-03-05 09:13:22 as
	Plasma–wall interactions during silicon etching processes in high-density HBr/Cl2/O2 plasmas [My Copy] Plasma Sources Science and Technology, Vol. 14, No. 2. (2005), pp. S42-S52. by G. Cunge, M. Kogelschatz, O. Joubert, N. Sadeghi posted to absorption cl2-o2 parois plasma by these_morel on 2008-03-05 09:11:32 as
	Challenges in metal gate etching for logic applications [My Copy] In SEMI Technical Symposium (2003) by Shashank Deshmukh, Jinhan Choi, Meihua Shen, et al.Yan Du, Kyeong T. Lee, Sang I. Yi, Jae B. Yu, Thorsten Lill posted to cl2-o2 hbr sio2 titane_nitride by these_morel on 2006-05-10 08:13:25 as along with 1 person Stanley_vrc
	Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas [My Copy] Microelectronic Engineering, Vol. 65, No. 3. (March 2003), pp. 285-292. by Hyoun-Woo Kim, Byong-Sun Ju, Chang-Jin Kang, Joo-Tae Moon posted to cl2-o2 poly-si temperature tungsten-nitride by these_morel on 2006-03-21 14:36:30 as along with 2 people ashrafrkhan Stanley_vrc
	Temperature Effect on Tungsten Etching Using a Cl2/O2 Helicon Discharge [My Copy] Journal of the Korean Physical Society, Vol. 43, No. 4. (October 2003), pp. 526-528. by Hyoun W. Kim posted to cl2-o2 etching helicon-plasma temperature tungsten by these_morel on 2006-03-21 12:00:53 as along with 1 person Stanley_vrc
	Mass spectrometry studies of resist trimming processes in HBr/O[sub 2] and Cl[sub 2]/O[sub 2] chemistries [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 1. (2005), pp. 103-112. by E. Pargon, O. Joubert, T. Chevolleau, G. Cunge, Songlin Xu, Thorsten Lill posted to cl2-o2 hbr-o2 icp mass-spectrometry resist-trimming by these_morel on 2006-03-21 11:34:47 as
	Molybdenum gate technology for ultrathin-body MOSFETs and FinFETs [My Copy] Electron Devices, IEEE Transactions on, Vol. 51, No. 12. (2004), pp. 1989-1996. by Daewon Ha, H. Takeuchi, Yang-Kyu Choi, Tsu-Jae King posted to cl2-o2 etching molybdenum tcp_9400 by these_morel on 2006-03-17 15:12:21 as
	Etching of ruthenium coatings in O[sub 2]- and Cl[sub 2]-containing plasmas [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 1-8. by C. C. Hsu, J. W. Coburn, D. B. Graves posted to cl2-o2 plasma ruthenium by these_morel on 2006-02-28 15:18:11 as
	Control of etching-product-dependent shape and selectivity in gate polysilicon reactive ion etching [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 3. (1998), pp. 1038-1042. by Masaaki Sato, Yoshinobu Arita posted to cl2-o2 etching notching plasma poly-si rie selectivity sio2 by these_morel on 2006-02-28 15:04:44 as
	Radio frequency plasma etching of Si/SiO[sub 2] by Cl[sub 2]/O[sub 2] : Improvements resulting from the time modulation of the processing gases [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, No. 6. (1990), pp. 1185-1191. by S. C. Mcnevin posted to cl2-o2 etching gate plasma poly-si sio2 by these_morel on 2006-02-28 14:54:37 as
	Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558. by Jinghao Chen, Won J. Yoo, Zerlinda Y. L. Tan, Yingqian Wang, Daniel S. H. Chan posted to cl2-o2 fluorine hbr-o2 hfalo hfo2 hfon hfsio high-k xps by these_morel on 2006-02-17 15:12:43 as
	$My PDF fracassi_92_chemistry.pdf$ Chemistry of titanium dry etching in fluorinated and chlorinated gases [My Copy] pure and applied chemistry, Vol. 64, No. 5. (1992), pp. 703-707. by Francesco Fracassi, Riccardo D'agostino posted to cf4-o2 cl2-o2 titanium by these_morel on 2006-02-17 14:06:01 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's cl2-o2 [14 articles] Export

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