these_morel's cmos [5 articles] Export

Recent papers added to these_morel's library classified by the tag cmos. You can also see everyone's cmos.

	Etude, fabrication et propriétés de transport de transistors CMOS associant un diélectrique haute permittivité et un canal de conduction haute mobilité [My Copy] (2005) by Olivier Weber posted to cmos introduction by these_morel on 2008-09-08 12:43:36 as
	Transistor MOS et sa technologie de fabrication [My Copy] Technique de l'ingénieur, No. E2430. (February 2000) by Thomas Skotnicki posted to cmos introduction microelectronics by these_morel on 2008-07-10 13:36:06 as
	Physics of Semiconductor Devices [My Copy] (04 November 1981) by Simon M. Sze posted to cmos introduction microelectronics by these_morel on 2008-07-10 13:28:17 as along with 1 person kristgy
	3D Integration of CMOS transistors with ICV-SLID technology [My Copy] Microelectronic Engineering In Proceedings of the ninth european workshop on materials for advanced metallization 2005, Vol. 82, No. 3-4. (December 2005), pp. 529-533. by Robert Wieland, Detlef Bonfert, Armin Klumpp, et al.Reinhard Merkel, Lars Nebrich, Josef Weber, Peter Ramm posted to 3d-integration cmos microelectronics by these_morel on 2008-05-14 11:38:36 as
	In search of "Forever," continued transistor scaling one new material at a time [My Copy] IEEE Transactions on Semiconductor Manufacturing In Semiconductor Manufacturing, IEEE Transactions on, Vol. 18, No. 1. (2005), pp. 26-36. by S. E. Thompson, R. S. Chau, T. Ghani, K. Mistry, S. Tyagi, M. T. Bohr posted to cmos vlsi by these_morel on 2008-03-06 15:30:31 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's cmos [5 articles] Export

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