these_morel's dielectric [9 articles] Export

Recent papers added to these_morel's library classified by the tag dielectric. You can also see everyone's dielectric.

	Plasma etching of HfO[sub 2] at elevated temperatures in chlorine-based chemistry [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 30-40. by M. Helot, T. Chevolleau, L. Vallier, et al.O. Joubert, E. Blanquet, A. Pisch, P. Mangiagalli, T. Lill posted to cl2 dielectric etching hfo2 high-k by these_morel on 2006-02-21 09:56:36 as
	Etching of high-k dielectric Zr[sub 1 - x]Al[sub x]O[sub y] films in chlorine-containing plasmas [My Copy] The 47th international symposium: Vacuum, thin films, surfaces/interfaces, and processing NAN06, Vol. 19, No. 4. (2001), pp. 1361-1366. by K. Pelhos, V. M. Donnelly, A. Kornblit, et al.M. L. Green, R. B. Van Dover, L. Manchanda, Y. Hu, M. Morris, E. Bower posted to bcl3 cl2 dielectric high-k zralo by these_morel on 2006-02-21 09:50:49 as
	Ion-enhanced chemical etching of HfO[sub 2] for integration in metal--oxide--semiconductor field effect transistors [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2420-2427. by Lin Sha, Ragesh Puthenkovilakam, You S. Lin, Jane P. Chang posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:36:28 as
	Etch characteristics of HfO2 films on Si substrates [My Copy] Applied Surface Science, Vol. 187, No. 1-2. (14 February 2002), pp. 75-81. by S. Norasetthekul, P. Y. Park, K. H. Baik, et al.K. P. Lee, J. H. Shin, B. S. Jeong, V. Shishodia, D. P. Norton, S. J. Pearton posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:28:42 as
	Hafnium and zirconium silicates for advanced gate dielectrics [My Copy] Journal of Applied Physics, Vol. 87, No. 1. (2000), pp. 484-492. by G. D. Wilk, R. M. Wallace, J. M. Anthony posted to dielectric high-k by these_morel on 2006-02-21 09:01:27 as
	Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process [My Copy] Electrochemical and Solid-State Letters, Vol. 8, No. 10. (2005), pp. G271-G274. by Zhibo Zhang, S. C. Song, Craig Huffman, et al.Muhammad M. Hussain, Joel Barnett, Naim Moumen, Husam N. Alshareef, Prashant Majhi, Johnny H. Sim, Sang H. Bae, Byoung H. Lee posted to dielectric gate high-k metal wet-etching by these_morel on 2006-02-17 15:40:27 as
	Effect of hydrogen peroxide on hydrofluoric acid etching of high-k materials: ESR investigations [My Copy] Journal of Non-Crystalline Solids In Papers from the Michael Weinberg Symposium, Vol. 351, No. 18. (15 June 2005), pp. 1559-1564. by V. Lowalekar, S. Raghavan posted to dielectric etching high-k materials by these_morel on 2006-02-17 15:36:47 as
	Effects of Nitrogen Additive Gas on Sidewall Passivation in W/TiN/High-k Dielectric Gate Etching [My Copy] Microprocesses and Nanotechnology Conference, 2000 International (2000), pp. 210-211. by Jae-Young Kim, Yu-Kwon Kim, Kwang-Ok Kim, Chang J. Choi, Jin W. Kim posted to dielectric etching gate high-k metal tin tungsten by these_morel on 2006-02-17 13:47:00 as
	Metal gate technology for nanoscale transistors--material selection and process integration issues [My Copy] Thin Solid Films, Vol. 462-463 (September 2004), pp. 34-41. by Yee-Chia Yeo posted to dielectric gate high-k materials metal work-function by these_morel on 2006-02-07 11:15:53 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's dielectric [9 articles] Export

these_morel's tags