these_morel's dispositifs-experimentaux [26 articles] Export

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	Etching: Closed-loop bias voltage control for plasma etching [My Copy] Solid State Technology, Vol. 43, No. 2. (February 2000) by Roger Patrick, Scott Baldwin, Norman Williams posted to dispositifs-experimentaux lam by these_morel on 2008-09-11 15:43:00 as
	Transmission electron microscopy: A critical analytical tool for ULSI technology [My Copy] The 1998 international conference on characterization and metrology for ULSI technology, Vol. 449, No. 1. (1998), pp. 667-675. by David Venables, David W. Susnitzky, John A. Mardinly edited by David G. Seiler, Alain C. Diebold, Murray W. Bullis, Thomas J. Shaffner, Robert Mcdonald, Jane E. Walters posted to dispositifs-experimentaux eels tem by these_morel on 2008-09-11 09:50:02 as
	Anisotropic etching of SiO[sub 2] in low-frequency CF[sub 4]/O[sub 2] and NF[sub 3]/Ar plasmas [My Copy] Journal of Applied Physics, Vol. 55, No. 1. (1984), pp. 242-252. by V. M. Donnelly, D. L. Flamm, Dautremont W. C. Smith, D. J. Werder posted to actinometry dispositifs-experimentaux nf3 by these_morel on 2008-09-11 08:05:35 as
	Microscopie électronique en transmission Transmission conventionnelle et balayage en transmission [My Copy] Techniques de l'ingénieur (April 1988) by François Louchet, Jean-Louis Verger-Gaugry, Jany Thibault-Desseaux, Pierre Guyot posted to dispositifs-experimentaux tem by these_morel on 2008-08-19 13:51:43 as
	Plasmas froids de décharge - Applications et diagnostic [My Copy] Techniques de l'ingénieur, Vol. D2835 (November 1997) by Anne-Marie Pointu, Jérôme Perrin posted to dispositifs-experimentaux reactor by these_morel on 2008-08-19 07:10:04 as
	A simple analysis of an inductive RF discharge [My Copy] Plasma Sources Science and Technology, Vol. 1, No. 3. (1992), pp. 179-186. by R. B. Piejak, V. A. Godyak, B. M. Alexandrovich posted to dispositifs-experimentaux icp plasma reactor by these_morel on 2008-08-18 12:31:10 as
	Application of a low-pressure radio frequency discharge source to polysilicon gate etching [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, No. 1. (1990), pp. 1-4. by J. M. Cook, D. E. Ibbotson, D. L. Flamm posted to dispositifs-experimentaux icp plasma reactor by these_morel on 2008-08-18 12:30:18 as
	Review of inductively coupled plasmas for plasma processing [My Copy] Plasma Sources Science and Technology, Vol. 1, No. 2. (1992), pp. 109-116. by J. Hopwood posted to dispositifs-experimentaux icp plasma reactor by these_morel on 2008-08-18 12:29:26 as
	Determination of electromagnetic properties of low-pressure electrodeless inductive discharges [My Copy] Journal of Physics D: Applied Physics, Vol. 23, No. 3. (1990), pp. 293-298. by J. W. Denneman posted to dispositifs-experimentaux icp plasma reactor by these_morel on 2008-08-18 12:28:16 as
	Mesures dimensionnelles par interférométrie laser [My Copy] Techniques de l'ingénieur, Vol. R1320 (1995) by Geneviève Lipinski posted to dispositifs-experimentaux interferometry by these_morel on 2008-08-13 12:43:26 as
	Quantitative analysis of angle-resolved XPS spectra recorded in parallel data acquisition mode [My Copy] Surface and Interface Analysis, Vol. 36, No. 13. (2004), pp. 1629-1636. by M. S. Vinodh, L. P. H. Jeurgens posted to arxps dispositifs-experimentaux xps by these_morel on 2008-08-12 07:02:25 as
	Etude des interactions plasma–surface pendant la gravure du silicium dans des plasmas HBr/Cl2/O2 [My Copy] (2004) by Martin Kogelschatz posted to dispositifs-experimentaux introduction plasma by these_morel on 2008-08-11 10:27:20 as
	The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of Carbonyls [My Copy] Journal of Electrochemical Society, Vol. 117, No. 5. (1970), pp. 693-700. by L. H. Kaplan, F. M. D'heurle posted to chemical-vapor-deposition dispositifs-experimentaux tungsten by these_morel on 2008-07-24 14:16:14 as
	Spectral Library of Persistent Emission Lines. [My Copy] (1990) by D. S. Malchow posted to actinometry dispositifs-experimentaux by these_morel on 2008-07-23 15:18:24 as
	Etude des mécanismes de gravure du Si à basse température par un faisceau plasma de SF6 extrait d'une source d'ions à décharge micro-onde = Study of the etching of Si at low substrate temperature using a SF6 plasma beam extracted from a microwave ion source [My Copy] (1998) by Thierry Chevolleau posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:59:49 as
	Mass spectrometric detection of reactive neutral species: Beam-to-background ratio [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, No. 5. (1999), pp. 2447-2455. by Harmeet Singh, John W. Coburn, David B. Graves posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:52:48 as
	Spectrométrie de masse - Principe et appareillage [My Copy] Techniques de l'ingénieur, Vol. P2645 (June 2005) by Guy Bouchoux, Michel Sablier posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:47:54 as
	Mass spectrometry: Principles and applications [My Copy] (14 January 2007) by Edmond de Hoffmann posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:45:12 as
	Analyse de surface par ESCA - Analyse élémentaire et applications [My Copy] Techniques de l'ingénieur, Vol. P2626 (September 1998) by Tran M. Duc posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:17:11 as
	Spectroscopies de photoélectrons: XPS ou ESCA et UPS [My Copy] Techniques de l'ingénieur, Vol. P2625 (April 1986) by Guy Hollinger posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:14:45 as
	Handbook of X Ray Photoelectron Spectroscopy (P/N 624755) [My Copy] (1992) by John F. Moulder, William F. Stickle, Peter E. Sobol posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:06:24 as
	Practical Surface Analysis: Auger and X-Ray Photoelectron Spectroscopy [My Copy] (23 August 1983) by D. Briggs, M. P. Seah posted to dispositifs-experimentaux xps by these_morel on 2008-07-21 15:01:32 as
	Grazing incidence specular reflectivity: theory, experiment, and applications [My Copy] Solid State Sciences, Vol. 2, No. 2. (1 May 2000), pp. 257-278. by A. Van der Lee posted to dispositifs-experimentaux xrr by these_morel on 2008-07-18 13:43:25 as
	Caractérisation des surfaces et des matériaux stratifiés par rayons X [My Copy] Techniques de l'ingénieur, Vol. P1085 (January 1996) by Pierre Dhez posted to dispositifs-experimentaux xrr by these_morel on 2008-07-18 13:41:44 as
	Scanning Electron Microscopy and X-ray Microanalysis [My Copy] (2002) by Joseph Goldstein, Dale E. Newbury, David C. Joy, et al.Charles E. Lyman, Patrick Echlin, Eric Lifshin, L. C. Sawyer, J. R. Michael posted to dispositifs-experimentaux meb by these_morel on 2008-07-18 13:23:33 as along with 1 person denisamparo
	Microscopie électronique à balayage - Principe et équipement [My Copy] Techniques de l'ingénieur, Vol. P865 (March 2006) by Claude Le Gressus, Henri Paqueton, Jacky Ruste posted to dispositifs-experimentaux meb by these_morel on 2008-07-18 13:20:53 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's dispositifs-experimentaux [26 articles] Export

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