these_morel's high-k [22 articles] Export

Recent papers added to these_morel's library classified by the tag high-k. You can also see everyone's high-k.

	Single Metal Gate on High-k Gate Stacks for 45nm Low Power CMOS [My Copy] Electron Devices Meeting, 2006. IEDM '06. International In Electron Devices Meeting, 2006. IEDM '06. International (2006), pp. 1-4. by W. J. Taylor, C. Capasso, B. Min, et al.B. Winstead, E. Verret, K. Loiko, D. Gilmer, R. I. Hegde, J. Schaeffer, J. Schaeffer, E. Luckowski, A. Martinez, M. Raymond, C. Happ, D. H. Triyoso, S. Kalpat, A. Haggag, D. Roan, J. Y. Nguyen, L. B. La, L. Hebert, J. Smith, D. Jovanovic, D. Burnett, M. Foisy, N. Cave, P. J. Tobin, S. B. Samavedam, Jr, S. Venkatesan posted to hfo2 high-k metal-gate tac by these_morel on 2008-05-21 07:12:22 as
	Physical and electrical properties of Ta--N, Mo--N, and W--N electrodes on HfO[sub 2] high-k gate dielectric [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 349-357. by Jiang Lu, Yue Kuo, Somenath Chatterjee, Jun Y. Tewg posted to high-k metal-gate molybdenum tan tungsten-nitride by these_morel on 2008-05-21 07:08:55 as
	Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition [My Copy] Japanese Journal of Applied Physics, Vol. 45, No. 10. (2006), pp. L297-L300. by Tomohiro Kitagawa, Keisuke Nakamura, Kazushi Osari, et al.Kazuo Takahashi, Kouichi Ono, Masanori Oosawa, Satoshi Hasaka, Minoru Inoue posted to bcl3-o2 ecr hfo2 high-k by these_morel on 2006-03-21 14:13:03 as along with 2 people Stanley_vrc gramcd
	Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks. [My Copy] Solid State Phenomena, Vol. 103-104 (2005), pp. 93-96. by M. Claes, V. Paraschiv, S. Beckx, et al.M. Demand, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt posted to high-k metal-gate ruthenium tan tin wet-etching by these_morel on 2006-03-21 11:47:05 as along with 1 person Stanley_vrc
	Selective Dry Etching of HfO2 in CF4 and Cl2/HBr-Based Chemistries. [My Copy] Japanese Journal of Applied Physics, Vol. 43, No. 4B. (April 2004), pp. 1864-1868. by Takeshi Maeda, Hiroyuki Ito, Riichiro Mitsuhashi, et al.Atsushi Horiuchi, Takaaki Kawahara, Akiyoshi Muto, Takaoki Sasaki, Kazuyoshi Torii, Hiroshi Kitajima posted to cf4 cl2 damage dhf dry-etching gate-patterning hbr hfo2 high-k wet-etching by these_morel on 2006-03-21 07:54:24 as along with 1 person molli0rm
	Selective Etching of HfO2 High-k Gate Material over Si in C4F8/Ar/H2 Plasmas. [My Copy] In 2004 Dry Process International Symposium (2004) by Kazuo Takahashi, Kouichi Ono posted to c4f8-ar-h2 hfo2 high-k icp by these_morel on 2006-03-21 07:41:44 as
	Development of Damage Free HfAlO Removal Process Using Plasma Treatment. [My Copy] In 2004 Dry Process International Symposium (2004) by J. W. Sun, C. H. Shin, G. J. Min, C. J. Kang, H. K. Cho, J. T. Moon posted to ar cf4 hfalo high-k plasma rie by these_morel on 2006-03-21 07:40:08 as
	Plasma etching of HfO[sub 2] at elevated temperatures in chlorine-based chemistry [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 30-40. by M. Helot, T. Chevolleau, L. Vallier, et al.O. Joubert, E. Blanquet, A. Pisch, P. Mangiagalli, T. Lill posted to cl2 dielectric etching hfo2 high-k by these_morel on 2006-02-21 09:56:36 as
	Etching of high-k dielectric Zr[sub 1 - x]Al[sub x]O[sub y] films in chlorine-containing plasmas [My Copy] The 47th international symposium: Vacuum, thin films, surfaces/interfaces, and processing NAN06, Vol. 19, No. 4. (2001), pp. 1361-1366. by K. Pelhos, V. M. Donnelly, A. Kornblit, et al.M. L. Green, R. B. Van Dover, L. Manchanda, Y. Hu, M. Morris, E. Bower posted to bcl3 cl2 dielectric high-k zralo by these_morel on 2006-02-21 09:50:49 as
	Ion-enhanced chemical etching of ZrO[sub 2] in a chlorine discharge [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 20, No. 5. (2002), pp. 1525-1531. by Lin Sha, Byeong O. Cho, Jane P. Chang posted to cl2 high-k zro2 by these_morel on 2006-02-21 09:47:00 as
	Plasma etching of high dielectric constant materials on silicon in halogen chemistries [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 1. (2004), pp. 88-95. by Lin Sha, Jane P. Chang posted to bcl3 cl2 hfo2 high-k zro2 by these_morel on 2006-02-21 09:44:45 as
	Plasma etching selectivity of ZrO[sub 2] to Si in BCl[sub 3]/Cl[sub 2] plasmas [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 21, No. 6. (2003), pp. 1915-1922. by Lin Sha, Jane P. Chang posted to bcl3 cl2 etching high-k zro2 by these_morel on 2006-02-21 09:40:20 as along with 2 people blswenson newmansc
	Ion-enhanced chemical etching of HfO[sub 2] for integration in metal--oxide--semiconductor field effect transistors [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2420-2427. by Lin Sha, Ragesh Puthenkovilakam, You S. Lin, Jane P. Chang posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:36:28 as
	Etch characteristics of HfO2 films on Si substrates [My Copy] Applied Surface Science, Vol. 187, No. 1-2. (14 February 2002), pp. 75-81. by S. Norasetthekul, P. Y. Park, K. H. Baik, et al.K. P. Lee, J. H. Shin, B. S. Jeong, V. Shishodia, D. P. Norton, S. J. Pearton posted to dielectric hfo2 high-k by these_morel on 2006-02-21 09:28:42 as
	Hafnium and zirconium silicates for advanced gate dielectrics [My Copy] Journal of Applied Physics, Vol. 87, No. 1. (2000), pp. 484-492. by G. D. Wilk, R. M. Wallace, J. M. Anthony posted to dielectric high-k by these_morel on 2006-02-21 09:01:27 as
	Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process [My Copy] Electrochemical and Solid-State Letters, Vol. 8, No. 10. (2005), pp. G271-G274. by Zhibo Zhang, S. C. Song, Craig Huffman, et al.Muhammad M. Hussain, Joel Barnett, Naim Moumen, Husam N. Alshareef, Prashant Majhi, Johnny H. Sim, Sang H. Bae, Byoung H. Lee posted to dielectric gate high-k metal wet-etching by these_morel on 2006-02-17 15:40:27 as
	Plasma etching of high-k and metal gate materials [My Copy] Vacuum, Vol. In Press, Corrected Proof by Keisuke Nakamura, Tomohiro Kitagawa, Kazushi Osari, Kazuo Takahashi, Kouichi Ono posted to ecr hfo2 high-k metal by these_morel on 2006-02-17 15:39:06 as
	Effect of hydrogen peroxide on hydrofluoric acid etching of high-k materials: ESR investigations [My Copy] Journal of Non-Crystalline Solids In Papers from the Michael Weinberg Symposium, Vol. 351, No. 18. (15 June 2005), pp. 1559-1564. by V. Lowalekar, S. Raghavan posted to dielectric etching high-k materials by these_morel on 2006-02-17 15:36:47 as
	Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558. by Jinghao Chen, Won J. Yoo, Zerlinda Y. L. Tan, Yingqian Wang, Daniel S. H. Chan posted to cl2-o2 fluorine hbr-o2 hfalo hfo2 hfon hfsio high-k xps by these_morel on 2006-02-17 15:12:43 as
	Effects of Annealing and Ar Ion Bombardment on the Removal of HfO[sub 2] Gate Dielectric [My Copy] Electrochemical and Solid-State Letters, Vol. 7, No. 3. (2004), pp. F18-F20. by Jinghao Chen, Won J. Yoo, Daniel S. H. Chan, Dim L. Kwong posted to ar hf hfo2 high-k icp plasma wet-etching by these_morel on 2006-02-17 15:00:46 as
	Effects of Nitrogen Additive Gas on Sidewall Passivation in W/TiN/High-k Dielectric Gate Etching [My Copy] Microprocesses and Nanotechnology Conference, 2000 International (2000), pp. 210-211. by Jae-Young Kim, Yu-Kwon Kim, Kwang-Ok Kim, Chang J. Choi, Jin W. Kim posted to dielectric etching gate high-k metal tin tungsten by these_morel on 2006-02-17 13:47:00 as
	Metal gate technology for nanoscale transistors--material selection and process integration issues [My Copy] Thin Solid Films, Vol. 462-463 (September 2004), pp. 34-41. by Yee-Chia Yeo posted to dielectric gate high-k materials metal work-function by these_morel on 2006-02-07 11:15:53 as

Note: You may cite this page as: http://www.citeulike.org/user/these_morel/tag/high-k

plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's high-k [22 articles] Export

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