these_morel's mass-spectrometry [9 articles] Export

Recent papers added to these_morel's library classified by the tag mass-spectrometry. You can also see everyone's mass-spectrometry.

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	Gravure ionique réactive des couches minces de tungstène en plasmas radiofréquence de SF6/O2 [My Copy] (1993) by Marie-Claude Peignon posted to etching mass-spectrometry sf6-o2 tungsten by these_morel on 2008-12-08 07:11:53 as
	Etude des mécanismes de gravure du Si à basse température par un faisceau plasma de SF6 extrait d'une source d'ions à décharge micro-onde = Study of the etching of Si at low substrate temperature using a SF6 plasma beam extracted from a microwave ion source [My Copy] (1998) by Thierry Chevolleau posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:59:49 as
	Mass spectrometric detection of reactive neutral species: Beam-to-background ratio [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, No. 5. (1999), pp. 2447-2455. by Harmeet Singh, John W. Coburn, David B. Graves posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:52:48 as
	Spectrométrie de masse - Principe et appareillage [My Copy] Techniques de l'ingénieur, Vol. P2645 (June 2005) by Guy Bouchoux, Michel Sablier posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:47:54 as
	Mass spectrometry: Principles and applications [My Copy] (14 January 2007) by Edmond de Hoffmann posted to dispositifs-experimentaux mass-spectrometry by these_morel on 2008-07-23 09:45:12 as
	Plasma etching of refractory metals (W, Mo, Ta) and silicon in SF6 and SF6-O2. An analysis of the reaction products [My Copy] Plasma Chemistry and Plasma Processing, Vol. 5, No. 4. (1 December 1985), pp. 333-351. by A. Picard, G. Turban posted to etching mass-spectrometry molybdenum sf6-o2 tungsten by these_morel on 2007-03-30 15:41:30 as
	Ion flux composition in HBr/Cl[sub 2]/O[sub 2] and HBr/Cl[sub 2]/O[sub 2]/CF[sub 4] chemistries during silicon etching in industrial high-density plasmas [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 5. (2002), pp. 2137-2148. by G. Cunge, R. L. Inglebert, O. Joubert, L. Vallier, N. Sadeghi posted to etching hbr-cl2-o2 mass-spectrometry silicon by these_morel on 2007-03-21 16:14:22 as
	Nitrogen dissociation in a low pressure cylindrical ICP discharge studied by actinometry and mass spectrometry [My Copy] Journal of Physics D: Applied Physics, Vol. 38, No. 24. (2005), pp. 4278-4289. by T. Czerwiec, F. Greer, D. B. Graves posted to actinometry dissociation mass-spectrometry nitrogen by these_morel on 2006-12-14 13:52:37 as
	Mass spectrometry studies of resist trimming processes in HBr/O[sub 2] and Cl[sub 2]/O[sub 2] chemistries [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 1. (2005), pp. 103-112. by E. Pargon, O. Joubert, T. Chevolleau, G. Cunge, Songlin Xu, Thorsten Lill posted to cl2-o2 hbr-o2 icp mass-spectrometry resist-trimming by these_morel on 2006-03-21 11:34:47 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's mass-spectrometry [9 articles] Export

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