these_morel's metal-gate [8 articles] Export

Recent papers added to these_morel's library classified by the tag metal-gate. You can also see everyone's metal-gate.

	Tungsten metal gate etching in Cl[sub 2]/O[sub 2] inductively coupled high density plasmas [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 6. (2008), pp. 1875-1882. by T. Morel, S. Bamola, R. Ramos, A. Beaurain, E. Pargon, O. Joubert posted to cl2-nf3-o2 cl2-o2 metal-gate tungsten xps by these_morel on 2009-06-02 15:05:04 as
	Étude et développement de procédés de gravure plasma pour l’élaboration des grilles métalliques pour les filières technologiques CMOS : Cas de l’empilement Si/TiN/HfO2 [My Copy] (2006) by Anne Le Gouil posted to etching metal-gate tin by these_morel on 2008-08-11 10:05:10 as
	Molybdenum metal gate MOS technology for post-SiO<sub>2</sub> gate dielectrics [My Copy] Electron Devices Meeting, 2000. IEDM Technical Digest. International In Electron Devices Meeting, 2000. IEDM Technical Digest. International (2000), pp. 641-644. by Qiang Lu, R. Lin, P. Ranade, et al.Yee C. Yeo, Xiaofan Meng, H. Takeuchi, Tsu-Jae King, Chenming Hu, Hongfa Luan, Songjoo Lee, Weiping Bai, Choong-Ho Lee, Dim-Lee Kwong, Xin Guo, Xiewen Wang, Tso-Ping Ma posted to dual-metal-gate metal-gate molybdenum nitrogen by these_morel on 2008-05-21 12:01:46 as
	Development of plasma etching process for sub-50 nm TaN gate [My Copy] Thin Solid Films In Proceedings of The International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium H: Silicon Microelectronics:Processing to Packaging - ICMAT 2005 Symposium H, Vol. 504, No. 1-2. (10 May 2006), pp. 140-144. by Vladimir Bliznetsov, Rakesh Kumar, Lakshmi K. Bera, Loh W. Yip, Anyan Du, Tang E. Hui posted to metal-gate midgap tan by these_morel on 2008-05-21 07:32:57 as
	Single Metal Gate on High-k Gate Stacks for 45nm Low Power CMOS [My Copy] Electron Devices Meeting, 2006. IEDM '06. International In Electron Devices Meeting, 2006. IEDM '06. International (2006), pp. 1-4. by W. J. Taylor, C. Capasso, B. Min, et al.B. Winstead, E. Verret, K. Loiko, D. Gilmer, R. I. Hegde, J. Schaeffer, J. Schaeffer, E. Luckowski, A. Martinez, M. Raymond, C. Happ, D. H. Triyoso, S. Kalpat, A. Haggag, D. Roan, J. Y. Nguyen, L. B. La, L. Hebert, J. Smith, D. Jovanovic, D. Burnett, M. Foisy, N. Cave, P. J. Tobin, S. B. Samavedam, Jr, S. Venkatesan posted to hfo2 high-k metal-gate tac by these_morel on 2008-05-21 07:12:22 as
	Physical and electrical properties of Ta--N, Mo--N, and W--N electrodes on HfO[sub 2] high-k gate dielectric [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 349-357. by Jiang Lu, Yue Kuo, Somenath Chatterjee, Jun Y. Tewg posted to high-k metal-gate molybdenum tan tungsten-nitride by these_morel on 2008-05-21 07:08:55 as
	Reliable tantalum-gate fully-depleted-SOI MOSFET technology featuring low-temperature processing [My Copy] IEEE Transactions on Electron Devices In Electron Devices, IEEE Transactions on, Vol. 44, No. 9. (1997), pp. 1467-1472. by T. Ushiki, Mo-Chiun Yu, Y. Hirano, H. Shimada, M. Morita, T. Ohmi posted to gate introduction metal metal-gate resistivity by these_morel on 2008-05-20 10:02:41 as
	Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks. [My Copy] Solid State Phenomena, Vol. 103-104 (2005), pp. 93-96. by M. Claes, V. Paraschiv, S. Beckx, et al.M. Demand, W. Deweerd, S. Garaud, H. Kraus, R. Vos, J. Snow, W. Boullart, S. De Gendt posted to high-k metal-gate ruthenium tan tin wet-etching by these_morel on 2006-03-21 11:47:05 as along with 1 person Stanley_vrc

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's metal-gate [8 articles] Export

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