these_morel's tungsten-nitride [15 articles] Export

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	Interactions entre les plasmas de gravure à couplage inductif et les parois du réacteur [My Copy] (2008) by Raphael Ramos posted to parois tungsten tungsten-nitride wsi by these_morel on 2008-12-08 14:58:26 as
	RBS-ERDA, XPS and XRD characterizations of PECVD tungsten nitride films [My Copy] Applied Surface Science, Vol. 125, No. 3-4. (March 1998), pp. 313-320. by C. Meunier, C. Monteil, C. Savall, et al.F. Palmino, J. Weber, R. Berjoan, J. Durand posted to tungsten-nitride xps by these_morel on 2008-08-29 15:49:33 as
	Effect of NH[sub 3] on Film Properties of MOCVD Tungsten Nitride from Cl[sub 4](CH[sub 3]CN)W(N[sup i]Pr) [My Copy] Journal of The Electrochemical Society, Vol. 151, No. 10. (2004), pp. G697-G703. by Omar J. Bchir, Kee C. Kim, Timothy J. Anderson, Valentin Craciun, Benjamin C. Brooks, Lisa M. White posted to nh3 tungsten-nitride xps by these_morel on 2008-08-27 16:04:19 as
	Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System [My Copy] Japanese Journal of Applied Physics, Vol. 37 (1998), pp. 6819-6823. by Hong G. Lee, Seung Y. Lee, Ho S. Moon, Sang H. Kim, Joo-Hiuk S. Sohn, Jinho Ahn posted to etching icp sf6-ar sf6-n2 tungsten-nitride by these_morel on 2008-08-25 12:23:31 as
	Etude d’électrodes métalliques à base de tungstène, préparées par MOCVD, pour empilement de grille CMOS de technologie sub-65 nmTECHNOLOGIE SUB–65 nm [My Copy] (2006) by Stéphane Allegret posted to deposition tungsten tungsten-nitride by these_morel on 2008-07-24 14:21:01 as
	Physical and electrical properties of Ta--N, Mo--N, and W--N electrodes on HfO[sub 2] high-k gate dielectric [My Copy] Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 349-357. by Jiang Lu, Yue Kuo, Somenath Chatterjee, Jun Y. Tewg posted to high-k metal-gate molybdenum tan tungsten-nitride by these_morel on 2008-05-21 07:08:55 as
	Thermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(1 1 1) [My Copy] Surface Science, Vol. 600, No. 3. (1 February 2006), pp. 743-754. by Yaw-Wen Yang, Jin-Bao Wu, Jelin Wang, Yi-Feng Lin, Hsin-Tien Chiu posted to chemical-vapor-deposition tungsten-nitride xps by these_morel on 2007-03-30 15:56:19 as
	Composition, residual stress, and structural properties of thin tungsten nitride films deposited by reactive magnetron sputtering [My Copy] Journal of Applied Physics, Vol. 88, No. 3. (2000), pp. 1380-1388. by Y. G. Shen, Y. W. Mai, D. R. Mckenzie, Q. C. Zhang, W. D. Mcfall, W. E. Mcbride posted to deposition tungsten-nitride by these_morel on 2006-12-14 13:45:52 as
	The effect of nitrogen ion implantation on tungsten surfaces [My Copy] Applied Surface Science, Vol. 150, No. 1-4. (11 August 1999), pp. 34-38. by H. L. Zhang, D. Z. Wang, N. K. Huang posted to tungsten-nitride xps by these_morel on 2006-12-13 15:58:04 as
	Tungsten nitride films grown via pulsed laser deposition studied in situ by electron spectroscopies [My Copy] Applied Surface Science, Vol. 214, No. 1-4. (31 May 2003), pp. 58-67. by G. Soto, W. Delacruz, F. F. Castillon, J. A. Diaz, R. Machorro, M. H. Farias posted to tungsten-nitride xps by these_morel on 2006-12-13 15:55:32 as
	Reactive sputter deposition of tungsten nitride thin films [My Copy] Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 20, No. 5. (2002), pp. 1699-1703. by Colin C. Baker, Ismat S. Shah posted to resistivity sputter-deposition tungsten-nitride xps by these_morel on 2006-12-13 15:35:21 as
	Ultra thin tungsten nitride film growth on dielectric surfaces [My Copy] Thin Solid Films, Vol. 458, No. 1-2. (30 June 2004), pp. 251-256. by Sun, E. R. Engbrecht, T. Bolom, et al.C. Cilino, J. H. Sim, J. M. White, J. G. Ekerdt, K. Pfeifer posted to chemical-vapor-deposition tungsten-nitride wco6 xps by these_morel on 2006-06-19 10:07:54 as
	Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas [My Copy] Microelectronic Engineering, Vol. 65, No. 3. (March 2003), pp. 285-292. by Hyoun-Woo Kim, Byong-Sun Ju, Chang-Jin Kang, Joo-Tae Moon posted to cl2-o2 poly-si temperature tungsten-nitride by these_morel on 2006-03-21 14:36:30 as along with 2 people ashrafrkhan Stanley_vrc
	WSix/WN/polysilicon DRAM gate stack with a 50 A WN layer as a diffusion barrier and an etch stop [My Copy] Materials Science in Semiconductor Processing, Vol. 8, No. 5. (October 2005), pp. 602-607. by Heon Lee, Dong-Hwan Kim, Joo-Youl Huh, Deok-Kee Kim posted to cl2-nf3-o2 gate metal poly-si tcp tungsten-nitride wsi by these_morel on 2006-02-17 15:45:45 as
	Study of Conditions for Anisotropic Plasma Etching of Tungsten and Tungsten Nitride Using SF[sub 6]/Ar Gas Mixtures [My Copy] Journal of The Electrochemical Society, Vol. 149, No. 3. (2002), pp. G179-G183. by Reyes C. Betanzo, S. A. Moshkalyov, A. C. Ramos, J. A. Diniz, J. W. Swart posted to rie sf6-ar tungsten-nitride by these_morel on 2006-02-17 14:10:08 as

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plasma	54
etching	48
introduction	46
tungsten	45
xps	39
dispositifs-experimentaux	26
high-k	22
hfo2	19
rie	16
cl2	15
icp	15
tungsten-nitride	15
cl2-o2	14
poly-si	13
actinometry	11
microelectronics	11
gate	10
cf4	9
dielectric	9
mass-spectrometry	9
metal	9
silicon	9
fluorocarbon	8
metal-gate	8
parois	8
absorption	7
cf4-o2	7
fluorine	7
molybdenum	7
passivation	7
tin	7
plasmas	6
polydepletion	6
reactor	6
sf6	6
cleaning	5
cmos	5
hbr	5
notching	5
resist-trimming	5
sf6-ar	5
sf6-n2	5
sf6-o2	5
tan	5
titane_nitride	5
wsi	5
annexes	4
bcl3	4
ecr	4
hbr-cl2-o2	4
nf3	4
oxidation	4
sio2	4
wet-etching	4
ar	3
chemical-vapor-deposition	3
decomposition	3
dissociation	3
dual-metal-gate	3
effet-de-charge	3
nitrogen	3
optical-emission-spectroscopy	3
recess	3
resistivity	3
tem	3
temperature	3
tungsten-oxide	3
tunneling	3
volatility	3
work-function	3
zro2	3
arxps	2
bcl3-o2	2
c4f8	2
cf4-cl2	2
chf3	2
cl2-nf3-o2	2
deposition	2
doping	2
hbr-o2	2
helicon-plasma	2
hfalo	2
incorporation	2
materials	2
meb	2
microloading	2
nf3-o2	2
o2	2
polymer_layer	2
ruthenium	2
sicl4-cl2	2
titanium	2
wcl	2
wocl	2
wsix	2
xrr	2
3d-integration	1
45nm	1
aluminium	1
angle	1
bowing	1
c4f8-ar-h2	1
capacitive	1
cbrf3	1
ccl4-o2	1
cf3-cl	1
chf3-cl2-bcl3	1
clo	1
co	1
co2	1
damage	1
deformation-resist	1
dhf	1
dry-etching	1
eels	1
eftem	1
eot	1
etchback	1
floating_sample	1
gate-patterning	1
gravure	1
hf	1
hfn	1
hfon	1
hfsio	1
hfsion	1
interconnections	1
interferometry	1
lam	1
line-edge-roughness	1
lpcvd	1
magnetoplasma	1
masking-materials	1
microelectronique	1
microtrenching	1
midgap	1
molecular-beam-system	1
moores-law	1
morel	1
mosi	1
n2	1
negative-ion	1
neural-networks	1
new-devices	1
nf3-h2	1
nf3-he	1
nh3	1
overetch	1
oxygen	1
photoresist	1
pulverisation	1
selectivity	1
sf6-ar-cl2	1
sf6-chf3	1
silicidation	1
sputter-deposition	1
tac	1
taper	1
tcp	1
tcp_9400	1
thomas	1
time-delay-effect	1
tungstene	1
uhf-ecr	1
vlsi	1
wcl4	1
wco6	1
wiggling	1
zralo	1

these_morel's tungsten-nitride [15 articles] Export

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