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thomaswaechtler's Gessner:T [3 articles] Export Sort

Recent papers posted to thomaswaechtler's library by the author Gessner:T. You can also see everyone's Gessner:T.

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	Copper Oxide ALD from a Cu(I) < beta >-Diketonate: Detailed Growth Studies on SiO[sub 2] and TaN [My Copy] ECS Transactions, Vol. 25, No. 4. (2009), pp. 277-287. by Thomas Waechtler, Nina Roth, Robert Mothes, et al.Steffen Schulze, Stefan E. Schulz, Thomas Gessner, Heinrich Lang, Michael Hietschold edited by S. De Gendt, S. Bent, A. Delabie, et al.J. Elam, S. Kang, O. Van der Straten, A. Londergan posted to thin_film tantalum_nitride tan sio2 copper_oxide ald by thomaswaechtler on 2009-11-16 12:35:05 as
	Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2] [My Copy] Journal of The Electrochemical Society, Vol. 156, No. 6. (2009), pp. H453-H459. by Thomas Waechtler, Steffen Oswald, Nina Roth, et al.Alexander Jakob, Heinrich Lang, Ramona Ecke, Stefan E. Schulz, Thomas Gessner, Anastasia Moskvinova, Steffen Schulze, Michael Hietschold posted to acetylacetonate adhesion ald atomic barrier beta-diketonate bistri-n-butylphosphanecopperiacetylacetonate copper copperi cui deposition diffusion eels electron energy film layer loss metallization microscopy nitride oxide phosphane photoelectron precursor pressure ru ruthenium silica silicon sio2 specstroscopy spectroscopy ta tan tantalum tem thin transmission ulsi vapor x-ray xps by thomaswaechtler on 2009-05-26 09:17:12 as
	Development of different copper seed layers with respect to the copper electroplating process [My Copy] Microelectronic Engineering, Vol. 50, No. 1-4. (January 2000), pp. 433-440. by K. Weiss, S. Riedel, S. E. Schulz, et al.M. Schwerd, H. Helneder, H. Wendt, T. Gessner posted to copper cvd electroplating layer pvd seed by thomaswaechtler on 2007-03-08 12:21:53 as

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oxide	14
copper	13
ald	11
reduction	8
thermoelectrics	6
cvd	5
hydrogen	5
ruthenium	4
nitride	4
layer	4
deposition	3
precursor	3
atomic	3
xps	3
plasma	3
zinc	2
lead	2
tantalum	2
pbte	2
materials	2
tan	2
sio2	2
thermoelectric	2
thallium	2
ellipsometry	2
titanium	2
zno	2
telluride	2
simulation	2
tl	2
ordered	1
copper_oxide	1
power	1
hafnium	1
specstroscopy	1
hfo2	1
cu2o	1
al2o3	1
ammonia	1
tdmat	1
capacitor	1
bond	1
hopg	1
avd	1
thin	1
cupraselect	1
loss	1
dram	1
barrier	1
metallization	1
spectroscopic	1
pvd	1
nanowires	1
hfac	1
caltech	1
diffusion	1
tem	1
graphene	1
silica	1
highly	1
oxidation	1
alcohol	1
vapor	1
film	1
x-ray	1
vacuum	1
seed	1
acetylacetonate	1
thin_film	1
tantalum_nitride	1
cmp	1
material	1
ethanol	1
pyrolytic	1
cell	1
memory	1
solar	1
chemistry	1
adhesion	1
electroplating	1
energy	1
ulsi	1
electron	1
spectroscopy	1
mim	1
graphite	1
nanobelts	1
ta	1
photoelectron	1
aluminum	1
uv	1
bistri-n-butylphosphanecopperiacetylacetonate	1
sink	1
annealing	1
cui	1
review	1
coordination	1
pressure	1
copperi	1
silicon	1
ru	1
oxygen	1
tmvs	1
phosphane	1
aes	1
heat	1
precursors	1
mems	1
beta-diketonate	1
eels	1
microscopy	1
transmission	1
xaes	1

thomaswaechtler's Gessner:T [3 articles] Export Sort

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